| 시설장비 설명 |
Specifications 1. Performance 1) Resolution For High Resolution condition: 1.2nm guaranteed at 30 kV or better 2.0nm guaranteed at 1 kV or better For analytical condition: 3.0nm guaranteed at 15 kV, WD 10mm, 5nA or better Gentle beam Mode: Built-in 2) Magnification : x10 to x1,000,000 or wider Magnification preset : User can be switch instantaneously from any magnification to any preset magnification. 3) Image modes : SEI, BEI 2. Electron Optical System 1) Accelerating voltage : 0.2 to 30 kV or berrer 2) Electron Gun: ZrO/W(100)Shottky type Filament Built-in 3) Gun Bias Auto and Manual mode. 4) Probe current : Up to 2 x 10-7A at 15kV or better 5) Alignment : Mechanical and electromagnetic deflection (Mechanical alignment by user can not be required) |
